Company Filing History:
1 out of 10,341 
1 out of 9 Years Active: 1993
Title: Chitoshi Nogami: Innovator in CVD Process Tube Cleaning
Introduction
Chitoshi Nogami is a notable inventor based in Nara, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the cleaning processes of chemical vapor deposition (CVD) apparatuses. His innovative methods have improved efficiency and effectiveness in the industry.
Latest Patents
Chitoshi Nogami holds a patent for a method of cleaning a process tube. This method involves carrying silicon wafers out of the process tube and lowering the temperature within the tube to room temperature or slightly above. He supplies a cleaning gas containing ClF₃ into the process tube, which reacts with poly-silicon and amorphous silicon that have adhered to the inner wall of the tube. This innovative approach allows for the removal of stuck materials in a shorter time frame.
Career Highlights
Throughout his career, Chitoshi Nogami has worked with prominent companies in the semiconductor industry. He has been associated with Tokyo Electron Limited and Iwatani International Corporation, where he has applied his expertise in process engineering and innovation.
Collaborations
Chitoshi has collaborated with various professionals in his field, including his coworker Shigehito Ibuka. Their joint efforts have contributed to advancements in semiconductor manufacturing processes.
Conclusion
Chitoshi Nogami's contributions to the field of semiconductor manufacturing, particularly through his patented method of cleaning process tubes, highlight his innovative spirit and dedication to improving industry standards. His work continues to influence the efficiency of CVD processes in semiconductor production.