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Years Active: 2009
Title: The Innovative Contributions of Chistopher P Ausschnitt
Introduction
Chistopher P Ausschnitt is a notable inventor based in Lexington, MA (US). He has made significant contributions to the field of imaging technology, particularly through his innovative patent related to imaging tool calibration.
Latest Patents
Ausschnitt holds a patent for an "Imaging tool calibration artifact and method." This invention provides a method for determining and correcting distortions introduced by an imaging tool. The method involves providing an imaging tool with a field of view (FOV) and creating a target pattern that contains a regular array of symmetric sub-patterns spanning the FOV. By measuring the relative position of the sub-pattern images at various target orientations, the method allows for the determination of tool-induced sub-pattern position deviations from their designed locations. Corrections are then applied to compensate for orientation-independent components of these deviations. The target pattern can be mounted on a stage of the measurement tool, created on a mask used in the lithographic process, or produced on a wafer being measured.
Career Highlights
Throughout his career, Chistopher has worked with prominent companies, including IBM and Nanometrics Inc. His experience in these organizations has contributed to his expertise in imaging technologies and calibration methods.
Collaborations
Chistopher has collaborated with notable colleagues such as Lewis A Binns and Jennifer L Morningstar. These collaborations have likely enriched his work and contributed to advancements in the field.
Conclusion
Chistopher P Ausschnitt's innovative work in imaging tool calibration has made a significant impact in the technology sector. His patent demonstrates a practical approach to correcting imaging distortions, showcasing his expertise and dedication to advancing imaging technology.