Fuji, Japan

Chisei Shibuya


Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 1979-1986

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13 patents (USPTO):Explore Patents

Title: Chisei Shibuya: Innovator in Pharmaceutical Chemistry

Introduction

Chisei Shibuya is a prominent inventor based in Fuji, Japan. He has made significant contributions to the field of pharmaceutical chemistry, particularly in the development of novel compounds with antibacterial and antitumor properties. With a total of 13 patents to his name, Shibuya's work has had a considerable impact on medical science.

Latest Patents

Among his latest patents are innovative cephalosporin compounds that exhibit antibacterial activity. These compounds are represented by a general formula where R₁ signifies an amino group or a protected amino group. Additionally, he has developed secalonic acid derivatives that serve as antitumor agents. These derivatives are characterized by a specific formula where R can be a variety of groups, including hydrogen atoms, alkyl groups, and aryl groups, among others. The versatility of these compounds highlights Shibuya's expertise in creating effective pharmaceutical solutions.

Career Highlights

Chisei Shibuya has worked with notable companies such as Asahi Kasei Kogyo and Asahi Chemical Industry. His career has been marked by a commitment to advancing pharmaceutical research and development. His innovative spirit and dedication to his work have earned him recognition in the industry.

Collaborations

Throughout his career, Shibuya has collaborated with esteemed colleagues, including Masahiro Murakami and Masateru Kobayashi. These partnerships have fostered a collaborative environment that has led to groundbreaking advancements in pharmaceutical chemistry.

Conclusion

Chisei Shibuya's contributions to the field of pharmaceutical chemistry are noteworthy. His innovative patents and collaborations reflect his commitment to improving healthcare through scientific advancements. His work continues to inspire future generations of inventors and researchers.

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