Wrentham, MA, United States of America

Chiou C Yau

This inventor holds 4 USPTO granted patents. Top assignee: The Gillette Company. Active years: 1991-1999.


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1991-1999

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Chiou C Yau

Introduction

Chiou C Yau is a notable inventor based in Wrentham, MA (US). He has made significant contributions to the field of correction fluids, holding a total of 4 patents. His work reflects a commitment to developing innovative solutions that enhance everyday products.

Latest Patents

Chiou C Yau's latest patents include a unique aqueous correction fluid. This fluid features an opacifying agent that consists of a first opacifying pigment for hiding power and a second opacifying pigment for suspension redispersability. Additionally, it incorporates a cationic film-forming polymer, a nonionic film-forming polymer, and a dispersing agent. Another notable patent is for an ozone-friendly correction fluid, which includes a non-halogenated solvent, a butyl methacrylate copolymer as the polymeric film-forming material, a plasticizer, and an opacifying agent.

Career Highlights

Chiou C Yau is associated with The Gillette Company, where he has contributed to the development of innovative products. His work has been instrumental in advancing the technology behind correction fluids, making them more effective and environmentally friendly.

Collaborations

Chiou has collaborated with notable coworkers such as Norman G Sanborn and Kim H Ng. Their combined expertise has fostered a creative environment that encourages innovation and the development of new products.

Conclusion

Chiou C Yau's contributions to the field of correction fluids demonstrate his innovative spirit and dedication to improving product functionality. His patents reflect a blend of creativity and practicality, making a lasting impact in the industry.

Profile summary based on public USPTO records.
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