Company Filing History:
Years Active: 2010
Title: Innovations of Chinh Duc Tran in Plasma-Based EUV Radiation Sources
Introduction
Chinh Duc Tran is a notable inventor based in Goettingen, Germany. He has made significant contributions to the field of plasma-based EUV radiation sources, holding 2 patents that focus on enhancing the efficiency and effectiveness of these technologies.
Latest Patents
Tran's latest patents include an "Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source." This invention addresses the challenge of eliminating out-of-band radiation, which can interfere with the desired EUV range. The innovative solution involves a filter unit that utilizes a gas curtain to selectively absorb unwanted wavelengths while allowing the desired EUV radiation to pass through.
Another significant patent is the "Device for the generation of a gas curtain for plasma-based EUV radiation sources." This invention aims to create a robust gas curtain near the radiating plasma, ensuring a simple design that can withstand extreme thermal conditions. The device features a slit nozzle made of multiple materials, allowing for a broad gas curtain that meets various thermal and mechanical requirements.
Career Highlights
Chinh Duc Tran is currently employed at Xtreme Technologies GmbH, where he continues to develop cutting-edge technologies in the field of radiation sources. His work is pivotal in advancing the capabilities of plasma-based systems, contributing to both academic and industrial advancements.
Collaborations
Tran collaborates with esteemed colleagues such as Jesko Brudermann and Bjoern Mader. Their combined expertise fosters an environment of innovation and progress in their research endeavors.
Conclusion
Chinh Duc Tran's contributions to the field of plasma-based EUV radiation sources exemplify his commitment to innovation and technological advancement. His patents reflect a deep understanding of the challenges in this area and provide effective solutions that enhance the performance of radiation sources.