The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
May. 14, 2008
Chinh Duc Tran, Goettingen, DE;
Jesko Brudermann, Goettingen, DE;
Bjoern Mader, Hannover, DE;
Gilbert Dornieden, Duderstadt, DE;
Thomas Brauner, Berlin, DE;
Chinh Duc Tran, Goettingen, DE;
Jesko Brudermann, Goettingen, DE;
Bjoern Mader, Hannover, DE;
Gilbert Dornieden, Duderstadt, DE;
Thomas Brauner, Berlin, DE;
XTREME technologies GmbH, Jena, DE;
Abstract
The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.