Company Filing History:
Years Active: 2016
Title: The Innovative Contributions of Ching-Ting Yang in Photomask Inspection
Introduction
Ching-Ting Yang, an inventor based in Tainan, Taiwan, has made significant strides in the field of photomask inspection with his innovative patent. His work focuses on enhancing the performance of mask inspection processes, aiming to minimize false defect identification, which is crucial in the semiconductor manufacturing industry.
Latest Patents
Ching-Ting Yang holds a patent titled "Image process method to improve mask inspection performance." This patent introduces a method for inspecting photomasks that reduces the incidence of false defects. The process involves employing a variety of image rendering models, each emphasizing different design aspects. Specifically, the method includes two phases of image rendering simulation on an integrated circuit (IC) design to identify and eliminate falsely detected mask defects.
Career Highlights
Ching-Ting Yang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His technical expertise and innovative mindset have contributed to improvements in photomask inspection processes, which is essential for ensuring the reliability and functionality of semiconductor devices. His dedication to advancing technology is evident through his singular, impactful patent.
Collaborations
At Taiwan Semiconductor Manufacturing Company Limited, Ching-Ting Yang collaborates with notable coworkers, including Meng-Lin Lu and Chun-Jen Chen. These collaborations enhance the innovation process, allowing for the sharing of ideas and expertise in order to develop more effective solutions in photomask inspections and semiconductor processing.
Conclusion
In conclusion, Ching-Ting Yang stands out as an inventor who has made valuable contributions to the field of photomask inspection through his innovative patent. His work not only advances semiconductor technology but also exemplifies the essence of innovation within the industry. With continuing collaborations and a strong commitment to research and development, Yang’s future contributions will likely further enhance capabilities in this crucial area of technology.