Kaohsiung, Taiwan

Ching-Shiun Chiu


Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 32(Granted Patents)


Location History:

  • Kaohsiung, TW (2001 - 2002)
  • Cheng-Kung, TW (2002)

Company Filing History:


Years Active: 2001-2002

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5 patents (USPTO):Explore Patents

Title: Innovations of Ching-Shiun Chiu in Photomask Technology

Introduction

Ching-Shiun Chiu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of 5 patents. His work focuses on methods that enhance the fabrication and repair of phase-shifting photomasks, which are crucial in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Method of forming an improved attenuated phase-shifting photomask." This method involves a detailed process of fabricating an attenuating phase-shifting photomask, which includes multiple steps of exposing a photomask blank with varying pattern densities to E-beam energy. The process ensures precise control over the exposure, leading to improved photomask quality.

Another significant patent is the "Method for repairing the shifter layer of an alternating phase shift mask." This innovative approach utilizes a two-step process to repair defects in the shifter layer, ensuring that the repaired layer maintains similar light transmittance and phase angle shift as the original. This method is particularly beneficial for DUV APSM applications.

Career Highlights

Ching-Shiun Chiu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photomask technology has positioned him as a key contributor to advancements in this field.

Collaborations

Ching-Shiun collaborates with talented coworkers, including San-De Tzu and Wei-Zen Chou, who contribute to the innovative projects at their company. Their teamwork fosters an environment of creativity and technical excellence.

Conclusion

Ching-Shiun Chiu's contributions to photomask technology through his patents and collaborative efforts highlight his importance in the semiconductor industry. His innovative methods continue to influence the development of advanced manufacturing techniques.

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