Ching-Sheng Cho

Title: Innovations of Ching-Sheng Cho in Photosensitive Resins

Introduction

Ching-Sheng Cho is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resins. His innovative work has led to the creation of a unique resin that exhibits both UV-curable and alkaline-soluble properties.

Latest Patents

Ching-Sheng Cho holds a patent for a "Photosensitive phosphorylated phenol-formaldehyde resin and method for preparing the same." This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin characterized by containing at least two phosphate groups in its molecule, each coupled with at least one photo-sensitive group. The preparation method involves reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated resin, followed by esterification with a compound having one hydroxyl group and at least one ethylenically unsaturated bond. The resulting resin demonstrates excellent flame retardant and adhesive properties.

Career Highlights

Ching-Sheng Cho is affiliated with the Industrial Technology Research Institute, where he continues to advance research in innovative materials. His work has garnered attention for its practical applications in various industries, enhancing the performance and safety of products.

Collaborations

Ching-Sheng Cho has collaborated with notable colleagues, including Shinn-Jen Chang and Wan-Jung Teng, who contribute to the research and development of advanced materials.

Conclusion

Ching-Sheng Cho's contributions to the field of photosensitive resins exemplify the impact of innovative thinking in material science. His patented inventions not only advance technology but also pave the way for future developments in the industry.