Company Filing History:
Years Active: 2003
Title: Innovations of Ching-Hsing Chang in Semiconductor Fabrication
Introduction
Ching-Hsing Chang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in the industry.
Latest Patents
Ching-Hsing Chang holds a patent for a method titled "Dual trench alternating phase shift mask fabrication." This patent describes a process for fabricating a dual-trench alternating phase shift mask (PSM). The method involves patterning a chromium layer over a quartz layer of the PSM according to a semiconductor design. The quartz layer undergoes dry etching multiple times through photoresist layers, which are applied and patterned to create deep and shallow trenches. This innovative approach enhances the precision and efficiency of semiconductor manufacturing.
Career Highlights
Ching-Hsing Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.
Collaborations
Some of Ching-Hsing Chang's coworkers include San-De Tzu and Chang-Ming Dai. Their collaborative efforts in the field of semiconductor fabrication have further propelled innovations and improvements in manufacturing processes.
Conclusion
Ching-Hsing Chang's contributions to semiconductor fabrication through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the field. His innovative methods continue to influence the industry and pave the way for future advancements.