Chin-yuan Wu

Title: Innovations of Chin-yuan Wu

Introduction

Chin-yuan Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of wafer processing technology. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of cleaning and etching processes for semiconductor wafers.

Latest Patents

Wu's latest patents include a "Single wafer spin cleaning apparatus with soaking, cleaning, and etching functions." This invention features a spin driver device, a wafer spin chuck, and a wafer support disk. The design allows for efficient soaking and cleaning of wafers, ensuring high-quality processing. Another significant patent is the "Multifunctional single wafer soaking-spinning-cleaning device and wafer processing method." This invention outlines a comprehensive method that includes multiple steps for wafer processing, utilizing a multifunctional device that enhances the soaking and cleaning process.

Career Highlights

Chin-yuan Wu is associated with Grand Process Technology Corporation, where he applies his expertise in wafer processing technologies. His innovative designs and methods have contributed to advancements in the semiconductor industry.

Collaborations

Wu has collaborated with notable coworkers, including Li-tso Huang and Hsiu-kai Chang. Their combined efforts have led to the development of cutting-edge technologies in wafer processing.

Conclusion

Chin-yuan Wu's contributions to wafer processing technology through his patents demonstrate his commitment to innovation in the semiconductor field. His work continues to influence advancements in the industry, showcasing the importance of effective cleaning and etching processes.