Chin-Wen Chang

Title: The Innovations of Chin-Wen Chang

Introduction

Chin-Wen Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of liquid crystal technology. His innovative work has led to the development of a unique liquid crystal alignment solution.

Latest Patents

Chin-Wen Chang holds a patent for a liquid crystal alignment solution. This solution comprises a first polyimide-polyamide acid and a second polyimide-polyamide acid. The first polyimide-polyamide acid is represented by formula (A), while the second is represented by formula (B). In this formulation, T, T, and T are each independently a tetravalent residue of a tetracarboxylic acid dianhydride. Additionally, D, D, D, and D are each independently a divalent residue of a diamine. The parameters m, n, p, and q are each independently a positive integer, with the conditions m/(m+n) ≤ 0.5 and p/(p+q) ≥ 0.5.

Career Highlights

Chin-Wen Chang is currently associated with Daxin Material Corporation. His work at the company focuses on advancing materials used in liquid crystal applications. His innovative solutions have the potential to enhance the performance of liquid crystal displays.

Collaborations

Chin-Wen Chang has collaborated with notable colleagues, including Ming-Chih Lai and Wen-Chung Chu. These collaborations have contributed to the advancement of research and development in their field.

Conclusion

Chin-Wen Chang's contributions to liquid crystal technology exemplify the impact of innovative thinking in material science. His patent for a liquid crystal alignment solution showcases his expertise and commitment to advancing technology.