Hsinchu, Taiwan

Chin-Wang Hsu

This inventor holds 2 USPTO granted patents. Top assignee: Darwin Precisions Corporation. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chin-Wang Hsu. Retrieved from https://idiyas.com/inventor/chin-wang-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

Loading Chart...
2 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Chin-Wang Hsu:

Title: Pioneer in Innovation: The Visionary Inventor Chin-Wang Hsu

Introduction: Chin-Wang Hsu, hailing from Hsinchu County, TW, is a remarkable inventor whose relentless pursuit of innovation and passion for pushing technological boundaries has established him as a true visionary in the world of inventions.

Latest Patents: Chin-Wang Hsu has successfully patented a groundbreaking invention titled "Method of inspecting flatness of substrate." This method involves inspecting the flatness of a substrate by selecting first inspecting points along a straight line and calculating a flatness index based on specific formulas.

Career Highlights: As a trailblazer in the field of technology, Chin-Wang Hsu currently works at Darwin Precisions Corporation, where his innovative spirit shines. His dedication to creating revolutionary solutions has resulted in numerous breakthroughs that have garnered attention globally.

Collaborations: Chin-Wang Hsu's valuable contributions extend beyond his individual achievements. He collaborates closely with esteemed colleagues like Wen-Yi Lin, pooling their expertise to drive forward cutting-edge projects that inspire the next generation of inventors and innovators.

Conclusion: Chin-Wang Hsu's impact on the world of inventions is nothing short of extraordinary. His unwavering commitment to innovation, coupled with his visionary approach, sets him apart as a true pioneer in the field. His work continues to shape the landscape of technology, leaving a lasting legacy that will inspire generations to come.

If you would like more information or have any specific requests, feel free to let me know!

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…