Company Filing History:
Years Active: 2011
Title: Innovations of Chin-Sheng Yang in Thin-Film Technology
Introduction
Chin-Sheng Yang is a prominent inventor based in Taipei, Taiwan. He is known for his contributions to the field of thin-film technology, particularly through his innovative methods of deposition. His work has significant implications for various applications in electronics and materials science.
Latest Patents
Chin-Sheng Yang holds a patent for a method of forming thin-film structures by oblique-angle deposition. This method involves evaporating a target source in a chamber using an electron beam evaporation system. It also includes introducing process gas into the chamber, adjusting the tilt angle of the evaporation substrate, and controlling the temperature during evaporation. The result is a thin film formed on the substrate, which is then annealed to create a porous nanorod microstructure.
Career Highlights
Chin-Sheng Yang is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in thin-film technologies. His work has garnered attention for its innovative approach and practical applications in various fields.
Collaborations
Chin-Sheng Yang has collaborated with notable colleagues, including Chia-Hua Chang and Ching-Hua Chiu. These collaborations have further enriched his research and contributed to advancements in thin-film technology.
Conclusion
Chin-Sheng Yang's innovative methods in thin-film deposition represent a significant advancement in material science. His contributions continue to influence the field and inspire future research.