The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Nov. 05, 2008
Chia-hua Chang, Taipei County, TW;
Chin-sheng Yang, Taipei, TW;
Ching-hua Chiu, Taipei, TW;
Pei-chen Yu, Hsinchu, TW;
Hao-chung Kuo, Hsinchu, TW;
Chia-Hua Chang, Taipei County, TW;
Chin-Sheng Yang, Taipei, TW;
Ching-Hua Chiu, Taipei, TW;
Pei-Chen Yu, Hsinchu, TW;
Hao-Chung Kuo, Hsinchu, TW;
National Chiao Tung University, Hsin Chu, TW;
Abstract
A method of forming thin-film structure by oblique-angle deposition is provided. The method includes the steps of: evaporating target source in a chamber by an electron beam evaporation system, and introducing process gas into the chamber and adjusting tilt angle of the evaporation substrate and controlling temperature in the chamber during evaporation to form thin-film on a evaporation substrate by oblique-angle deposition, and then annealing the evaporation substrate to form a thin-film having porous nanorod microstructure.