Chin-Jui Hsu

Title: Innovations of Chin-Jui Hsu in Amorphous Carbon Films

Introduction

Chin-Jui Hsu is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of materials science, particularly in the development of amorphous carbon films. His innovative work has implications for semiconductor processing, showcasing his expertise and dedication to advancing technology.

Latest Patents

Chin-Jui Hsu holds a patent for "High density, modulus, and hardness amorphous carbon films at low pressure." This patent outlines methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate in a low-pressure chamber using a dual frequency radio frequency component. The use of low-pressure plasma enhanced chemical vapor deposition is highlighted, which increases the etch selectivity of the AHM, allowing for the use of a thinner AHM in semiconductor processing operations. He has 1 patent to his name.

Career Highlights

Chin-Jui Hsu is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves research and development, where he applies his knowledge to create innovative solutions for complex challenges in semiconductor manufacturing.

Collaborations

Chin-Jui has collaborated with several talented individuals in his field, including Matthew Scott Weimer and Ragesh Puthenkovilakam. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Chin-Jui Hsu's contributions to the field of amorphous carbon films demonstrate his commitment to innovation and excellence. His work not only enhances semiconductor processing but also reflects the importance of collaboration in driving technological advancements.