Singapore, Singapore

Chin Hung Koh

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chin Hung Koh. Retrieved from https://idiyas.com/inventor/chin-hung-koh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Chin Hung Koh - Innovator in Printer Calibration Technology.

Introduction

Chin Hung Koh is a notable inventor based in Singapore, SG. He has made significant contributions to the field of printing technology. His innovative approach has led to the development of a unique patent that enhances printer calibration.

Latest Patents

Chin Hung Koh holds a patent for a "Printer to determine calibration pattern." This invention operates a printer to determine an attribute of a field of view of the scan sensor. A calibration test pattern is determined based on the field of view, specifically considering the size of the field of view relative to the dimension of individual bars in the pattern. This patent showcases his expertise in improving printing accuracy and efficiency.

Career Highlights

Chin Hung Koh is associated with Hewlett-Packard Development Company, L.P., where he has been instrumental in advancing printer technology. His work has contributed to the development of innovative solutions that address common challenges in the printing industry.

Collaborations

Chin Hung Koh has collaborated with talented individuals such as Kang Leng Tan and Tong Nam Samuel Low. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Chin Hung Koh's contributions to printer calibration technology exemplify his innovative spirit and dedication to improving printing solutions. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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