Hsinchu, Taiwan

Chin-Hsing Su


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Profile: Chin-Hsing Su and His Gas-Supply System Patent

Introduction: Chin-Hsing Su is a notable inventor based in Hsinchu, Taiwan. With a focus on innovations in gas supply technology, he holds a patent for a unique system designed to enhance the efficiency and safety of gas flow management. His contributions to the field mark significant advancements in the industry.

Latest Patents: Chin-Hsing Su's notable patent is titled “Gas-supply system and method.” This innovative gas-supply system includes essential components such as a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device that is electrically connected to the gas flow controller. A buffer tank is incorporated into the design, configured to receive gas from the container. Additionally, a pressure transducer is strategically placed on the buffer tank to generate pressure signals based on the gas pressure, allowing the operation device to adjust the gas flow controller accordingly. This system effectively maintains the gas pressure within a predetermined range, illustrating its practical application in gas management.

Career Highlights: Chin-Hsing Su is affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading organization in semiconductor manufacturing. His role at TSMC has allowed him to apply his innovative thinking and technical expertise within a dynamic and challenging environment.

Collaborations: Throughout his career, Chin-Hsing Su has collaborated with talented colleagues such as Yung-Long Chen and Chun-Feng Hsu. These partnerships demonstrate an invaluable cooperative spirit within the field, resulting in advancements that benefit the entire industry.

Conclusion: Chin-Hsing Su stands out as an influential inventor in gas supply technology. His dedication to innovation has not only contributed to advancements within his company, TSMC, but has also paved the way for future developments in gas management systems. By holding a patent that addresses crucial safety and efficiency concerns, he continues to inspire and lead in the realm of invention.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…