Chin-Hon Fan

Title: **Innovative Contributions of Inventor Chin-Hon Fan**

Introduction

Chin-Hon Fan, an accomplished inventor based in Miaoli Hsien, Taiwan, has made significant strides in the field of technology with his innovative patents. With a total of two patents to his name, his work highlights advancements in material science and electrical devices, showcasing his dedication to pushing the boundaries of technology.

Latest Patents

Chin-Hon Fan's latest patents include a method for fabricating a diamond film with low surface roughness and a design for a micro-structure capacitor. The diamond film patent involves a process where a diamond layer is deposited on a substrate, followed by a binder layer that forms a laminate structure with a carrier plate. The removal of the substrate results in a diamond film that possesses a low surface roughness, enhancing its applications in various industries.

The micro-structure capacitor patent describes an innovative capacitor formed by joining the metal layer of a multi-porous micro-structure. By using a substrate as an etching stop layer, the process ensures the formation of pores with a low aspect ratio and uniform size, increasing the efficiency of the subsequent thin film coating process. This porous three-dimensional structure leads to a capacitor design that is small yet boasts high capacitance, a significant advancement in the field of electronics.

Career Highlights

Chin-Hon Fan is affiliated with the Industrial Technology Research Institute, an esteemed organization dedicated to research and development in Taiwan. His work at the institute has allowed him to explore various technological innovations, contributing to his success as an inventor.

Collaborations

Throughout his career, Chin-Hon Fan has collaborated with esteemed colleagues, including Hung-Yin Tsai and Hung-Yi Lin. These partnerships have fostered an environment of creativity and innovation, enhancing the quality and impact of their collective work.

Conclusion

Chin-Hon Fan's contributions to technology through his patents reflect his commitment to innovation and improvement in material sciences and electrical engineering. His work continues to inspire future generations of inventors and researchers in the pursuit of groundbreaking advancements.