The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Aug. 07, 2003
Ping-yin Liu, Yungho, TW;
Chun-hao Hsieh, Taipei, TW;
Chin-hon Fan, Miao Li Hsien, TW;
Hung-yin Tsai, Taipei, TW;
Chien-chang Su, Kaohsiung, TW;
Ping-Yin Liu, Yungho, TW;
Chun-Hao Hsieh, Taipei, TW;
Chin-Hon Fan, Miao Li Hsien, TW;
Hung-Yin Tsai, Taipei, TW;
Chien-Chang Su, Kaohsiung, TW;
Industrial Technology Research Institute, Hsinchu Hsien, TW;
Abstract
A process for making a diamond film with low surface roughness. A substrate is provided. A diamond layer is deposited on the substrate. A binder layer is coated over the diamond layer. A carrier plate is provided to join with the binder layer, thereby forming a laminate structure. The substrate is then removed, thereby obtaining a diamond film with a low surface roughness with respect to the surface roughness of the removed substrate.