Company Filing History:
5 out of 4,227 
1 out of 16,080 Years Active: 1976-1981
Title: Biography of Inventor Chin H Chang
Introduction
Chin H Chang is a notable inventor based in Edison, NJ (US), recognized for his contributions to the field of chemical engineering. He holds a total of six patents, showcasing his innovative approach to solving complex problems in vapor adsorption and separation technologies.
Latest Patents
His latest patents include "Vapor phase adsorption using nonstoichiometric carbon-sulfur compounds," which highlights the effectiveness of these compounds as adsorbents for separating organic vapors from gaseous mixtures. This method is particularly efficient for the separation of aromatic compounds, and the spent adsorbent can be regenerated for further use. Another significant patent is "Use of nonstoichiometric carbon-sulfur compounds to remove components," which demonstrates the ability of these compounds to effectively remove a variety of organic and inorganic materials from polar liquids, especially biorefractory organics like aromatics.
Career Highlights
Chin H Chang has had a distinguished career, working with prominent organizations such as Exxon Research and Engineering Company and the United States of America, as represented by the Secretary of the Navy. His work has significantly advanced the understanding and application of adsorption technologies.
Collaborations
Throughout his career, Chang has collaborated with esteemed colleagues, including John M Longo and David William Savage. These partnerships have contributed to the development of innovative solutions in his field.
Conclusion