Chin-Chou Huang

Title: Innovative Contributions of Chin-Chou Huang in Semiconductor Technologies

Introduction

Chin-Chou Huang is a distinguished inventor based in Pleasanton, California, renowned for his significant contributions to the semiconductor industry. With two patented innovations to his name, Huang's work focuses on enhancing overlay control and measurement accuracy in lithography processes.

Latest Patents

Huang's latest patents are pivotal in addressing geometry induced overlay errors in semiconductor manufacturing. The first patent, titled "Breakdown analysis of geometry induced overlay and utilization of breakdown analysis for improved overlay control," discloses systems and methods that provide improved measurements and predictions of geometry induced overlay errors. This patent emphasizes a cascading analysis process that dissects wafer geometry induced overlay into various components. Through this analysis, Huang enhances the effectiveness factors for each component, leading to improved prediction accuracy of the impact of wafer geometry on overlay.

The second patent, "System and method for field-by-field overlay process control using measured and estimated field parameters," outlines a method for determining correctable parameters for process tools. It involves measuring parameter values at specified locations on the wafer and estimating values for unmeasured fields, ultimately redefining process control methods in the industry.

Career Highlights

Chin-Chou Huang is currently associated with KLA-Tencor Corporation, a leader in providing process control and yield management solutions for the semiconductor industry. His work at the company focuses on innovative methods to optimize semiconductor manufacturing processes, thereby enhancing efficiency and yield.

Collaborations

Throughout his career, Huang has collaborated with esteemed colleagues, including Bill Pierson and Ramkumar Karur-Shanmugam. These collaborations have fostered a strong environment for innovation, facilitating the development of groundbreaking technologies in overlay measurement and control.

Conclusion

In conclusion, Chin-Chou Huang's inventive contributions significantly impact the semiconductor manufacturing landscape. His patents demonstrate a profound understanding of overlay control processes, which are crucial for enhancing measurement accuracy and yield in lithographic applications. As he continues to innovate, Huang's work remains an integral part of advancing semiconductor technologies.