Chin-Chong Chiang

Title: Chin-Chong Chiang: Innovator in Plasma Enhanced Atomic Layer Deposition Technology

Introduction

Chin-Chong Chiang is an inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of atomic layer deposition technology. His innovative approach focuses on enhancing the efficiency and effectiveness of deposition processes.

Latest Patent Applications

Chiang's notable patent application is titled "PLASMA ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND THE CONTROLLING METHOD THEREOF." This application presents a plasma enhanced atomic layer deposition apparatus that includes multiple reaction chambers. Each chamber is designed with a first and a second reaction space, along with an adjustable partition unit. This unit is controlled to either separate or allow communication between the two reaction spaces. Additionally, the apparatus features several heating carriers positioned within the reaction chambers. The method described in the application manipulates the movement of the partition plate, which leads to the separation or communication of the reaction spaces. This design aims to prevent interference or inter-reaction between process gases and resultant particles that could contaminate substrates.

Conclusion

Chin-Chong Chiang's work in plasma enhanced atomic layer deposition technology showcases his innovative spirit and dedication to advancing the field. His contributions, particularly through his latest patent application, highlight the potential for improved processes in material deposition.