Chikayuki Okamoto

Title: Chikayuki Okamoto: Innovator in Fine Pattern Formation

Introduction

Chikayuki Okamoto is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of fine pattern formation, holding a total of 3 patents. His innovative methods have advanced the technology used in various applications.

Latest Patents

One of Okamoto's latest patents involves a method of forming fine patterns. This method utilizes sidewalls of patterned resist that are reformed using a reforming agent selected from a specific group. The agents include (a) a carbon trichloride radical, (b) a mixture of silicon ion and oxygen ion, (c) a mixture of carbon ion and carbon monoxide ion, (d) a chlorine radical, (e) aluminum trichloride liquid, and (f) dibutyl magnesium liquid. The sidewall reformed portions are formed on the sidewalls of the pattern resist. The unrefined portions of the patterned resist are then removed, leaving the sidewall reformed portions on the object layer. Subsequently, the portion of the object layer, excluding the area immediately below the sidewall reformed portions, is etched away, resulting in the formation of fine patterns on the object layer.

Career Highlights

Throughout his career, Chikayuki Okamoto has worked with prominent companies, including Mitsubishi Electric Corporation and Ryoden Semiconductor System Engineering Corporation. His experience in these organizations has contributed to his expertise in the field of semiconductor technology and pattern formation.

Collaborations

Okamoto has collaborated with notable coworkers such as Tadashi Nishioka and Satoru Kawazu. Their joint efforts have furthered advancements in the technologies they have worked on together.

Conclusion

Chikayuki Okamoto's innovative work in fine pattern formation has made a significant impact in the field. His patents and collaborations reflect his dedication to advancing technology in semiconductor applications.