This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Screen Holdings Co., Ltd.. Active years: 2019-2021.
Company Filing History:
Years Active: 2019-2021
Title: Chikara Sagae: Innovator in Substrate Processing Technologies
Introduction
Chikara Sagae is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate cleaning and processing methods.
Latest Patents
Sagae's latest patents include a substrate cleaning device, a substrate processing apparatus, a substrate cleaning method, and a substrate processing method. The substrate cleaning device features a polishing head that contacts one surface of a substrate rotated by a spin chuck. The polishing head is designed to move between the center and the outer periphery of the substrate, allowing for effective polishing and removal of contaminants. The capacity for removing contaminants can be adjusted based on the position in the radial direction of the substrate, enhancing the cleaning process.
The substrate treating method disclosed by Sagae involves a solvent supplying step where a solvent is applied to the center part of a substrate while increasing its rotation speed. This method ensures that the solvent covers the substrate surface entirely, effectively suppressing particles and improving the quality of the cleaning process.
Career Highlights
Chikara Sagae is currently employed at Screen Holdings Co., Ltd., where he continues to develop innovative solutions in substrate processing. His work has been instrumental in advancing technologies that enhance the quality and efficiency of substrate treatment.
Collaborations
Some of his notable coworkers include Hiromi Murachi and Ryuichi Yoshida, who have collaborated with him on various projects related to substrate processing technologies.
Conclusion
Chikara Sagae's contributions to substrate processing technologies have established him as a key figure in the field. His innovative patents reflect a commitment to improving cleaning and processing methods, ultimately benefiting the industry.