Chiba, Japan

Chihiro Tamura

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Resonac Hard Disk Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chihiro Tamura. Retrieved from https://idiyas.com/inventor/chihiro-tamura-xy73bcpt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chihiro Tamura: Advancing Secure Substrate Handling

Introduction

Chihiro Tamura is an inventor associated with Resonac Hard Disk Corporation in Chiba, Japan. Her patent work addresses the safe handling of disk-shaped substrates during film formation.

Latest Patents

Tamura is named on 1 patent: “Substrate Holder, Substrate Holding Method, and Film Formation Apparatus.” The invention is designed to inhibit substrates from falling and to reduce deformation or breakage. Its holder places a disk-shaped substrate upright in a hole and uses at least four elastically deformable supports around the perimeter. Two supports contact upper circumferential portions, while the other two support lower circumferential portions. The patent specifies the supports’ positions by central-angle ranges relative to the substrate’s uppermost and lowermost points.

Career Highlights

Tamura’s documented patent contribution focuses on substrate-holder design and methods for holding substrates in film-formation equipment. This work addresses practical challenges in supporting delicate disk-shaped materials.

Collaborations

Kengo Nogami and Kazuyuki Yoshino are listed as Tamura’s coworkers. The available information does not specify their roles in the patent.

Conclusion

Chihiro Tamura’s patent reflects a focused contribution to substrate handling, with a design intended to improve stability and help prevent damage during film formation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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