Company Filing History:
Years Active: 2020
Title: Chihiro Sato: Innovator in Particle Generation Prevention
Introduction
Chihiro Sato is a prominent inventor based in Miyagi, Japan. She has made significant contributions to the field of vacuum technology, particularly in methods that prevent particle generation in vacuum apparatuses. Her innovative approach has garnered attention in the industry, showcasing her expertise and dedication to advancing technology.
Latest Patents
Chihiro Sato holds a patent for a "Particle generation preventing method and vacuum apparatus." This invention provides a method for preventing particle generation in a vacuum apparatus that includes an alumite-treated component. The process involves an evacuation step to reduce pressure within the vacuum apparatus to less than or equal to 1.3×10 Pa (1 mTorr), followed by a pressure-increasing step to atmospheric pressure. Finally, a moisture adhesion step is implemented to ensure moisture adheres to the alumite-treated component after the pressure increase. This innovative method addresses critical challenges in maintaining the integrity of vacuum systems.
Career Highlights
Chihiro Sato is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. Her work at this esteemed organization has allowed her to apply her innovative ideas and contribute to the development of advanced technologies. With her patent, she has established herself as a key player in her field.
Collaborations
Chihiro collaborates with notable colleagues, including Takashi Tetsuka and Hiroshi Nagaike. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.
Conclusion
Chihiro Sato's contributions to the field of vacuum technology through her innovative patent demonstrate her commitment to advancing the industry. Her work not only addresses significant challenges but also paves the way for future innovations in particle generation prevention.