Company Filing History:
Years Active: 2019-2023
Title: Chihiro Abe: Innovator in Semiconductor Manufacturing
Introduction
Chihiro Abe is a prominent inventor based in Yokkaichi, Japan. She has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase her innovative approaches.
Latest Patents
Her latest patents include an etching method and a semiconductor manufacturing apparatus. The etching method involves alternately switching between a first step and a second step. In the first step, a first gas containing a fluorine atom is introduced without supplying radiofrequency voltage to form a surface layer on a target cooled to a temperature equal to or lower than the liquefaction temperature of the gas. The second step introduces a different second gas and supplies radiofrequency voltage to generate plasma, which etches the target through sputtering. Additionally, her method for manufacturing a semiconductor device includes forming a first mask layer with an opening, selectively removing a first layer, and forming a second mask layer with a second opening that crosses the first. This innovative approach enhances the precision of semiconductor device manufacturing.
Career Highlights
Chihiro Abe has worked with notable companies such as Kioxia Corporation and Toshiba Memory Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in semiconductor technology.
Collaborations
Some of her coworkers include Toshiyuki Sasaki and Hisataka Hayashi. Their collaborative efforts have further propelled innovations in the semiconductor field.
Conclusion
Chihiro Abe's contributions to semiconductor manufacturing through her patents and career achievements highlight her as a key figure in the industry. Her innovative methods continue to influence the development of advanced semiconductor devices.