Chihhsin Lin

Title: Innovations by Chihhsin Lin in Thermal Chamber Technology

Introduction

Chihhsin Lin is a notable inventor based in Shanghai, China, recognized for his contributions to semiconductor technology. He holds three patents that enhance the efficiency and accuracy of temperature detection in thermal chambers, which are crucial in the semiconductor manufacturing process.

Latest Patents

One of Chihhsin Lin's latest patents is a method for detecting the temperature of a thermal chamber. This innovative method involves conducting a thermal treatment at a predicted temperature to a selected silicon wafer within the thermal chamber. The process includes obtaining a haze value corresponding to the predicted temperature and establishing a linear relationship between temperature and haze. After polishing and washing the silicon wafer, a second thermal treatment is conducted, allowing for the calculation of the actual temperature difference of the thermal chamber based on the haze difference observed. This method significantly increases the efficiency and accuracy of temperature detection, reduces fluctuations caused by silicon wafer thickness and resistivity, enhances the utilization of silicon wafers, and ultimately lowers costs.

Career Highlights

Chihhsin Lin is currently employed at Zing Semiconductor Corporation, where he continues to innovate in the field of semiconductor technology. His work focuses on improving processes that are vital for the production of high-quality silicon wafers.

Collaborations

Chihhsin Lin collaborates with talented coworkers, including Gongbai Cao and Liying Liu, who contribute to the innovative environment at Zing Semiconductor Corporation.

Conclusion

Chihhsin Lin's work in developing methods for temperature detection in thermal chambers showcases his commitment to advancing semiconductor technology. His patents not only improve manufacturing processes but also contribute to cost reduction and efficiency in the industry.