Chih-Wei Huang

Title: Chih-Wei Huang: Innovator in Semiconductor Technology

Introduction

Chih-Wei Huang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 16 patents. His innovative work has paved the way for advancements in electronic devices and systems.

Latest Patents

Among his latest patents, Chih-Wei Huang has developed a semiconductor structure that includes a substrate, an isolation layer, a dielectric layer, an insulation layer, a conductor, and a capping layer. This semiconductor structure features a concave portion in the substrate, with the isolation layer positioned on the top surface. The dielectric layer is located on the isolation layer, while the insulation layer extends to the sidewall of the isolation layer. The conductor, situated in the concave portion, has a first top surface closer to the dielectric layer than the second top surface. The capping layer covers the conductor within the concave portion. Additionally, he has worked on a dual lens driving recorder, showcasing his versatility in innovation.

Career Highlights

Chih-Wei Huang has had a successful career, working with notable companies such as Via Technologies, Inc. and Aten International Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and product development.

Collaborations

Throughout his career, Chih-Wei Huang has collaborated with talented individuals, including Zhiguo Chen and Chao-An Chen. These partnerships have fostered a creative environment that has led to groundbreaking innovations.

Conclusion

Chih-Wei Huang's contributions to semiconductor technology and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work continues to influence the development of advanced electronic systems and devices.