Taichung, Taiwan

Chih-Ping Yang

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Ping Yang. Retrieved from https://idiyas.com/inventor/chih-ping-yang-rwmwofbs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2002

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Chih-Ping Yang: Innovator in Dielectric Etch Processes

Introduction

Chih-Ping Yang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in dielectric etch methods. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Chih-Ping Yang holds a patent for an "Integrated post-etch treatment for a dielectric etch process." This patent addresses the challenges associated with byproducts formed on the sidewalls of contact vias during the dielectric etch process. The method he developed efficiently removes these byproducts and reduces polymer accumulation on process chamber surfaces. The post-etch treatment method includes exposing a semiconductor structure to a plasma generated from a source gas comprising oxygen, a nitrogen-comprising gas, and a reactive gas comprising hydrogen, carbon, and fluorine. This innovative approach is performed within the same processing chamber as the dielectric etch process, streamlining the manufacturing workflow.

Career Highlights

Chih-Ping Yang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on improving etch processes, which are critical for defining patterns and interconnect filling spaces in semiconductor devices. His contributions have been instrumental in advancing the technology used in modern semiconductor fabrication.

Collaborations

Chih-Ping Yang has collaborated with notable colleagues, including Hui Ou-Yang and Lin Ye. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of semiconductor technology.

Conclusion

Chih-Ping Yang's contributions to dielectric etch processes exemplify the importance of innovation in semiconductor manufacturing. His patented methods not only enhance efficiency but also address critical challenges in the industry. Through his work at Applied Materials, Inc., he continues to push the boundaries of technology in this vital field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…