This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Chih-Pang Chen: Innovator in Dielectric Etch Processes
Introduction
Chih-Pang Chen is a notable inventor based in Yonghe, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of dielectric etch processes. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor fabrication.
Latest Patents
Chih-Pang Chen holds a patent for an "Integrated post-etch treatment for a dielectric etch process." This patent addresses the challenges associated with byproducts formed on the sidewalls of contact vias during the dielectric etch process. The method he developed efficiently removes these byproducts and reduces polymer accumulation on process chamber surfaces. The post-etch treatment method includes exposing a semiconductor structure to a plasma generated from a source gas comprising oxygen, a nitrogen-comprising gas, and a reactive gas comprising hydrogen, carbon, and fluorine. This innovative approach is performed within the same processing chamber as the dielectric etch process, streamlining the overall manufacturing workflow.
Career Highlights
Chih-Pang Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on improving processes that are critical to the production of advanced semiconductor devices. His contributions have been instrumental in enhancing the performance and reliability of semiconductor manufacturing techniques.
Collaborations
Chih-Pang Chen has collaborated with notable colleagues, including Hui Ou-Yang and Chih-Ping Yang. These collaborations have fostered a productive environment for innovation and have led to advancements in semiconductor technology.
Conclusion
Chih-Pang Chen's work in dielectric etch processes exemplifies the importance of innovation in the semiconductor industry. His patented methods not only improve manufacturing efficiency but also contribute to the overall advancement of technology in this critical field.