Chih-Ling Hsiao

Title: Chih-Ling Hsiao: Innovator in Semiconductor Technology

Introduction

Chih-Ling Hsiao is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure that enhances performance and efficiency.

Latest Patents

Chih-Ling Hsiao holds 1 patent for a semiconductor structure. This structure includes an insulator, a semiconductor fin, a gate stack, a gate contact, a source/drain material, and a source/drain contact structure. The semiconductor fin protrudes from the insulator, while the gate stack is disposed on both the semiconductor fin and the insulator. The gate contact is electrically connected to the gate stack, and the source/drain material is placed on the semiconductor fin. The source/drain contact structure is also electrically connected to the source/drain material. The semiconductor fin extends along a first direction, and the gate stack extends along a second direction that is different from the first. An offset S in the second direction between the gate contact and the source/drain contact structure satisfies the condition: 0

Career Highlights

Chih-Ling Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to further his research and development efforts in semiconductor technologies.

Collaborations

Chih-Ling has collaborated with notable coworkers, including Yen-Ching Wu and Chung-Kai Lin. Their combined expertise has contributed to advancements in semiconductor innovations.

Conclusion

Chih-Ling Hsiao is a key figure in semiconductor technology, with a focus on innovative structures that improve device performance. His contributions continue to shape the future of the semiconductor industry.