Company Filing History:
1 out of 7,087 
1 out of 36 
Years Active: 2000-2001
Title: Innovations by Chih-Jen Chang
Introduction
Chih-Jen Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of wafer alignment systems and exposure technologies. With a total of 2 patents, his work has advanced the efficiency and accuracy of semiconductor manufacturing processes.
Latest Patents
One of his latest patents is a wafer alignment system. This system aligns a wafer by checking the alignment marks formed on the back surface of the wafer. A number of guiding rays are utilized to determine the corresponding alignment mark on the back of the wafer, ensuring proper alignment. The alignment system includes a wafer stage and a fixed base, both containing apertures that allow the guiding rays to pass through and strike the alignment marks on the wafer.
Another significant patent is for an exposure system that performs synchronized off-axis alignment. This exposure system features at least two wafer pads for holding wafers simultaneously, allowing for various tasks such as exposing, aligning, and loading or unloading wafers. The system includes an exposing unit, a wafer supporting unit, and an alignment beam scan unit. The wafer-supporting unit contains at least two wafer pads, while the alignment beam scan unit features an interferometer for detecting interference patterns formed by the alignment beams and the alignment marks on the wafers.
Career Highlights
Chih-Jen Chang has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and United Integrated Circuits Corporation. His experience in these organizations has contributed to his expertise in wafer technology and innovation.
Collaborations
Throughout his career, Chih-Jen has collaborated with notable colleagues such as Ming-Sung Wu and Tseng-Lung Chen. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Chih-Jen Chang's contributions to wafer alignment systems and exposure technologies have made a significant impact on the semiconductor industry. His innovative patents reflect his dedication to improving manufacturing processes and enhancing efficiency.