Chih-Hsiang Wu

Title: Inventor Spotlight: Chih-Hsiang Wu

Introduction

Chih-Hsiang Wu, a notable inventor from Taipei County, Taiwan, has made significant contributions to the field of memory structure technology. With a focus on innovative designs, his work continues to influence advancements in memory fabrication methods.

Latest Patents

Chih-Hsiang Wu holds a patent for a "Memory Structure and Method of Making the Same." This invention presents a memory structure featuring control gates and floating gates strategically positioned in recessed trenches. The fabrication process described in the patent includes several important steps, starting with providing a substrate that contains a first recessed trench. A first gate dielectric layer is then formed on this trench, followed by a first conductive layer. This conductive layer is etched to create a spacer that acts as a floating gate on the sidewall of the trench. Additional steps involve forming a second recessed trench and an inter-gate dielectric layer to enhance the performance of the memory structure.

Career Highlights

Chih-Hsiang Wu is associated with Nan Ya Technology Corporation, where he engages in cutting-edge research and development in the field of memory technologies. His dedication and innovative approach have solidified his reputation as a forward-thinking inventor.

Collaborations

Throughout his career, Chih-Hsiang Wu has collaborated with talented colleagues, including Ching-Nan Hsiao and Pei-Ing Paul Lee. These collaborations have fostered a productive environment for innovation and have led to the enhancement of memory-related technologies.

Conclusion

Chih-Hsiang Wu exemplifies the spirit of innovation in memory technology, with his single patent reflecting a significant milestone in the industry. His work at Nan Ya Technology Corporation and his collaborative efforts highlight his commitment to improving memory structures, paving the way for future advancements.