Chih-Hang Hsu

Title: Innovations of Chih-Hang Hsu in Photosensitive Resin Technology

Introduction

Chih-Hang Hsu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His work has implications for various applications, including protective films and liquid crystal display elements.

Latest Patents

Chih-Hang Hsu holds a patent for a photosensitive resin composition, protective film, and liquid crystal display element. This invention showcases a photosensitive resin composition that offers excellent transparency and high chemical resistance. The composition consists of a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) features a main chain and a side chain, with the main chain comprising a repeating unit derived from siloxane (meth)acrylate-based monomer (a1-2). The side chain includes a repeating unit derived from a siloxane-based monomer (a2), which is bonded to the repeating unit derived from the siloxane (meth)acrylate-based monomer (a1-2). The complex resin (A) meets at least one of the specified conditions for enhanced performance.

Career Highlights

Chih-Hang Hsu is associated with Chi Mei Corporation, where he has been instrumental in advancing the company's research and development efforts. His innovative work has contributed to the company's reputation in the materials science sector.

Collaborations

Chih-Hang Hsu has collaborated with notable colleagues, including Ming-Ju Wu and Chun-An Shih. These collaborations have fostered a productive environment for innovation and development within their field.

Conclusion

Chih-Hang Hsu's contributions to the field of photosensitive resin technology highlight his role as a key inventor in the industry. His patented innovations continue to influence advancements in protective films and liquid crystal displays.