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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10162260 B1

PDFFull Text
Date of Patent:
Dec. 25, 2018

Filed:

Dec. 07, 2016

Photosensitive resin composition, protective film, and liquid crystal display element

Applicant:

Chi Mei Corporation, Tainan, TW;

Inventors:

Chih-Hang Hsu, Kaohsiung, TW;

Ming-Ju Wu, Tainan, TW;

Chun-An Shih, Tainan, TW;

Assignee:

Chi Mei Corporation, Tainan, TW;

Attorney:

JCIPRNET

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/022 (2006.01); C08F 220/06 (2006.01); C08F 220/28 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); C08F 2/48 (2006.01); C08F 230/08 (2006.01); G03F 7/075 (2006.01); G02F 1/1333 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08F 2/48 (2013.01); C08F 220/06 (2013.01); C08F 220/28 (2013.01); C08F 230/08 (2013.01); G03F 7/0226 (2013.01); G03F 7/0392 (2013.01); G03F 7/0758 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/327 (2013.01); G03F 7/40 (2013.01); C08F 2220/282 (2013.01); G02F 1/1333 (2013.01); G02F 1/1335 (2013.01); G02F 2201/50 (2013.01);
Abstract

The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II):

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