Chih-Feng Huang

Title: Chih-Feng Huang: Innovator in Semiconductor Technology

Introduction

Chih-Feng Huang is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods and structures that enhance the performance of electronic devices.

Latest Patents

Huang's latest patents include a method for wet etching of high-k thin films at low temperatures. This invention discloses an electrode structure for light-emitting diodes (LEDs) and the manufacturing method of these electrodes. The process involves forming a pn junction on a substrate, depositing a layer of SiO2, and creating a transparent conductive layer. Additionally, a layer of gold or AuGe is formed with an opening at the center of the die. This method ensures the formation of ohmic contact through heat treatment, facilitating efficient wire bonding and electrode formation.

Another significant patent by Huang is the structure of a Metal Oxide Semiconductor Field Effect Transistor (MOSFET). This invention comprises a Silicon-On-Insulator (SOI) device, a MOS formed on the SOI device, and a metal-silicide layer. The SOI device includes a substrate, an insulation layer, and a silicon layer. The metal-silicide layer is created through a metal-aligned process, enhancing the performance of the transistor by modifying the Schottky Barrier and reducing Carrier Injection Resistance.

Career Highlights

Chih-Feng Huang has worked with prominent organizations, including Grand Plastic Technology Corporation and National Yang Ming Chiao Tung University. His experience in these institutions has allowed him to collaborate with other experts in the field and contribute to advancements in semiconductor technology.

Collaborations

Huang has collaborated with notable colleagues such as Bing-Yue Tsui and Hsieh Yue Ho. These partnerships have further enriched his research and development efforts in the semiconductor industry.

Conclusion

Chih-Feng Huang is a distinguished inventor whose work in semiconductor technology has led to innovative patents that enhance electronic device performance. His contributions continue to influence the field and inspire future advancements.