Kaohsiung, Taiwan

Chih-Chung Lin

This inventor holds 1 USPTO granted patent. Top assignee: Metal Industries Research & Development Centre. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Chung Lin. Retrieved from https://idiyas.com/inventor/chih-chung-lin-cpaossur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 4.0

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Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Chih-Chung Lin: Innovator in Electromagnetic Tracking Technology

Introduction

Chih-Chung Lin is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of electromagnetic tracking technology. His innovative approach has led to the development of a patented control method that enhances positioning accuracy.

Latest Patents

Chih-Chung Lin holds a patent for a "Control method and controller related to electromagnetic tracking." This patent describes a method where a working position is determined based on the location of a magnetic field sensor relative to a magnetic field emitter. The method involves adjusting the electrical characteristics of either the magnetic field emitter or the sensor to improve positioning accuracy.

Career Highlights

Chih-Chung Lin is affiliated with the Metal Industries Research & Development Centre, where he applies his expertise in electromagnetic tracking. His work has been instrumental in advancing technologies that rely on precise positioning.

Collaborations

Chih-Chung Lin has collaborated with notable colleagues, including Zong-Hsin Liu and Po-Chi Hu. Their combined efforts contribute to the ongoing research and development in their field.

Conclusion

Chih-Chung Lin's innovative work in electromagnetic tracking technology exemplifies the impact of dedicated inventors in advancing scientific knowledge and practical applications. His contributions continue to influence the industry and improve technological capabilities.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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