This inventor holds 1 USPTO granted patent. Top assignee: Delta Electronics, Inc.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Innovations of Chih-Chun Chen in Arc Suppression Technology
Introduction
Chih-Chun Chen is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of electrical engineering, particularly in the development of arc suppression devices. His innovative work has led to the filing of a patent that addresses critical challenges in plasma technology.
Latest Patents
Chih-Chun Chen holds a patent for an "Arc suppression device and arc suppression method." This invention includes an AC to DC converter, a switch, a resistor, and a controller. The switch is strategically placed between the AC to DC converter and a plasma chamber. The resistor is connected in parallel with the switch. The AC to DC converter is designed to convert an AC voltage into a DC voltage, which is then supplied to the plasma chamber. The controller plays a crucial role by detecting the unit-time rate of change (ROC) of the plasma current. When the controller identifies that the unit-time ROC exceeds a specified threshold, it controls the switch to electrically isolate the AC to DC converter from the plasma chamber. This action effectively reduces the plasma current to a predetermined value through the resistor.
Career Highlights
Chih-Chun Chen is currently employed at Delta Electronics, Inc., where he continues to innovate and develop advanced technologies. His work at Delta Electronics has positioned him as a key player in the field of electrical engineering, particularly in applications involving plasma technology.
Collaborations
Chih-Chun Chen collaborates with talented colleagues such as Wei-Hsun Lai and Chien-Yu Wang. Their combined expertise fosters a creative environment that enhances the development of innovative solutions in their field.
Conclusion
Chih-Chun Chen's contributions to arc suppression technology exemplify the impact of innovative thinking in electrical engineering. His patent reflects a commitment to advancing technology and improving safety in plasma applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
