Company Filing History:
Years Active: 2004-2005
Title: Chih-Chuan Hsu: Innovator in Dielectric Technology
Introduction
Chih-Chuan Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of dielectric materials, particularly in reducing stress in thick film applications. With a total of 2 patents, his work has implications for various technological advancements.
Latest Patents
Hsu's latest patents include a method of reducing thick film stress of spin-on dielectric and the resulting sandwich dielectric structure. This invention provides a technique to reduce the stress of thick spin-on dielectric layers by forming a sandwich dielectric structure. A first dielectric layer is formed on a substrate by spin coating, followed by the formation of a liquid phase deposited (LPD) silica layer on the first dielectric layer. Finally, a second dielectric layer is formed on the LPD silica layer by spin coating. The LPD silica layer can also undergo nitrogen plasma treatment to enhance its thermal stability and anti-water penetration ability.
Career Highlights
Chih-Chuan Hsu is associated with the National Science Council, where he continues to innovate and contribute to research in dielectric materials. His work is recognized for its potential to improve the performance and reliability of electronic devices.
Collaborations
Hsu has collaborated with notable colleagues, including Ching-Fa Yeh and Yueh-Chuan Lee. These collaborations have further enriched his research and development efforts in the field.
Conclusion
Chih-Chuan Hsu's contributions to dielectric technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in modern technology.