Chih-Chien Huang

Title: **Innovative Contributions of Inventor Chih-Chien Huang**

Introduction

Chih-Chien Huang, a talented inventor based in Tainan, Taiwan, has made significant contributions to the field of semiconductor technology. With three patents to his name, Huang's work showcases his innovative approach and commitment to advancing the industry.

Latest Patents

One of Huang's latest patents focuses on a **semiconductor cleaning step**. This invention outlines a detailed process that provides a chamber equipped with a heater. The assembly includes performing a first deposition step to leave a residual layer on the chamber's sidewall, executing a carbon deposition step to create a carbon layer on the heater's surface, and employing a plasma cleaning process. This innovative method effectively removes both the residual layer and the carbon layer from the chamber’s surfaces.

Another remarkable patent describes a **manufacturing method of a resistive memory device**. The process initiates with the formation of a first electrode, followed by the creation of a first metal oxide layer. A multilayer insulator structure is built atop this layer, succeeded by the application of a second metal oxide layer and the formation of a second electrode. This inventive technique ensures that the multilayer insulator is strategically positioned between the two metal oxide layers, showcasing unique vertical atomic percent variations.

Career Highlights

Chih-Chien Huang is currently employed at United Semiconductor (Xiamen) Co., Ltd., where he is an integral part of the team driving innovations in semiconductor manufacturing. His expertise and inventiveness have helped position the company as a leading entity in the industry.

Collaborations

Throughout his career, Huang has collaborated with talented professionals, including Wen Yi Tan and Yuheng Liu. These partnerships have fostered an environment of creativity and have contributed to the successful development of groundbreaking technologies.

Conclusion

Chih-Chien Huang exemplifies the spirit of innovation within the semiconductor field. Through his inventive patents and collaborative efforts, he continues to pave the way for advancements that enhance semiconductor technology. His work not only reflects personal achievement but also contributes to the broader technological landscape, inspiring future innovations.