Chih-Chieh Yang

Title: Innovations of Chih-Chieh Yang

Introduction

Chih-Chieh Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on improving the efficiency and accuracy of semiconductor processing.

Latest Patents

One of his latest patents is titled "Alignment mark and method." This invention includes a diffraction-based overlay (DBO) mark that features an upper-layer pattern disposed over a lower-layer pattern, with the smallest dimension greater than about 5 micrometers. Additionally, it incorporates a calibration mark positioned substantially at the center of the DBO mark, with a smallest dimension less than about one-fifth the size of the DBO mark's smallest dimension. Another notable patent is "System and method for overlay error reduction." This patent describes semiconductor processing apparatuses and methods that involve flipping and rotating a semiconductor wafer between the patterning of its front and back sides using first and second reticles. The method enhances the precision of layer patterning on the semiconductor wafer.

Career Highlights

Chih-Chieh Yang has worked with notable companies in the semiconductor industry, including Realtek Semiconductor Inc. and Taiwan Semiconductor Manufacturing Company Limited. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Chih-Chieh Yang has collaborated with esteemed colleagues such as Shih-Hsiung Huang and Liang-Huan Lei. These collaborations have further enriched his work and contributions to the field.

Conclusion

Chih-Chieh Yang's innovative patents and career in the semiconductor industry highlight his significant impact on technology advancements. His work continues to influence the efficiency and accuracy of semiconductor processing methods.