This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Chih-Che Lin and Semiconductor Contamination Handling
Introduction
Chih-Che Lin is an inventor based in Jhubei, Taiwan. He is associated with Taiwan Semiconductor Manufacturing Co., Ltd. His patent work addresses contamination monitoring and process control in semiconductor lithography equipment.
Latest Patents
Lin is credited with 1 patent: “Contamination Handling for Semiconductor Apparatus.” The patent describes a lithography apparatus with a photoresist coating unit that performs coating processes on a substrate. A detection unit measures contamination from those processes on the apparatus’s sidewall. A controller then adjusts equipment operations by comparing the measured contamination level with a baseline cleanliness requirement.
Career Highlights
Lin’s disclosed invention focuses on detecting contamination and using that information to guide lithography apparatus operations. This approach connects equipment cleanliness monitoring with process adjustments in semiconductor manufacturing.
Collaborations
The provided information lists Fu-Chun Hsieh and Pei-Yi Su as Lin’s coworkers. Their specific contributions to the patent are not stated.
Conclusion
Chih-Che Lin’s patent highlights a practical approach to monitoring contamination and adjusting semiconductor lithography equipment to meet cleanliness requirements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile