This inventor holds 1 USPTO granted patent. Top assignee: Silterra Malaysia Sdn. Bhd.. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: The Innovative Contributions of Chiew Gie Lee
Introduction: Chiew Gie Lee is a prominent inventor based in Kuala Lumpur, Malaysia. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the efficiency of semiconductor substrates.
Latest Patents: Chiew Gie Lee holds a patent for a method of forming an isolation structure on a semiconductor substrate. This patent, titled "Shallow trench isolation," involves opening a portion of a pad oxide layer overlying the substrate using a process gas that includes an etchant gas and a polymer-forming gas. The method allows for the etching of a trench with distinct slopes, where the first slope is greater than 45 degrees and the second slope is less than 45 degrees. This innovative approach results in a more effective isolation structure, which is crucial for semiconductor performance. He has 1 patent to his name.
Career Highlights: Chiew Gie Lee is currently employed at Silterra Malaysia Sdn. Bhd., a leading semiconductor manufacturing company. His role involves research and development, where he applies his expertise to advance semiconductor technologies. His contributions have been instrumental in enhancing the company's product offerings and technological capabilities.
Collaborations: Chiew Gie Lee has worked alongside talented colleagues, including Inki Kim and Sang Yeon Kim. Their collaborative efforts have fostered an environment of innovation and creativity within their projects.
Conclusion: Chiew Gie Lee's work in semiconductor technology exemplifies the impact of innovative thinking in the industry. His patent for shallow trench isolation showcases his commitment to advancing technology and improving semiconductor performance. His contributions continue to influence the field and inspire future innovations.