Company Filing History:
Years Active: 2003
Title: Innovations of Chien-Ming Wang: Pioneering Optical Mask Technologies
Introduction: Chien-Ming Wang is a prominent inventor based in Hsinchu Hsien, Taiwan. With a focus on optical technology, he has made significant contributions to the field through his inventive prowess. Wang holds two patents that showcase his expertise in optical mask correction methods and phase shifting masks.
Latest Patents: Wang's latest patents include:
1. **Optical Mask Correction Method**: This innovation addresses the need for effective correction of optical mask patterns. The method involves providing a third pattern that integrates two strip-like patterns. The first modification step enhances the first strip-like pattern with assistant patterns, leading to a modified pattern. This innovation includes critical dimensions related to the main pattern and employs optical proximity correction techniques in subsequent steps.
2. **Alternating Phase Shifting Mask**: This patent features an alternating phase shifting mask designed for use in double exposure lithographic processes with a light source of 248 nm. The mask's innovative design consists of a quartz substrate with semi-dense lines adjacent to clear regions and dense-line patterns. It also includes phase shifting regions, which create a 180-degree phase difference essential for effective lithography.
Career Highlights: Chien-Ming Wang has made remarkable strides in his career at United Microelectronics Corporation, where his research and development efforts have positioned him as a leader in the industry. His focus on optical technologies has contributed to practical solutions within semiconductor manufacturing.
Collaborations: Throughout his career, Wang has collaborated with notable colleagues such as Chang-Jyh Hsieh and Jiunn-Ren Hwang. Their joint efforts have propelled advancements in optical technologies, further enhancing the capabilities of United Microelectronics Corporation.
Conclusion: Chien-Ming Wang stands out as an influential inventor in the field of optical technology. His innovative patents not only demonstrate his creativity and technical knowledge but also play a critical role in advancing lithographic processes. As technology continues to evolve, Wang's contributions will undoubtedly inspire future innovations in semiconductor manufacturing.