Chien-Hsing Lu is a prominent inventor based in Tainan, Taiwan, renowned for his significant contributions to the field of semiconductor technology. With a remarkable portfolio consisting of four patents, he has made strides in developing cutting-edge solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Chien-Hsing Lu's most recent patents include innovative technologies such as the "Jet Spray Nozzle and Method for Cleaning Photo Masks and Semiconductor Wafers." This advanced jet spray nozzle is designed specifically for cleaning photolithographic masks or semiconductor wafers. The nozzle incorporates a unique design featuring a water supply inlet, a gas supply inlet, gas injection nozzles, a mixing cavity, and a flow mixing baffle. The baffle is strategically arranged to combine gas and water, delivering a concentrated stream of gas and micro water droplets to effectively remove contaminant particles, all without the need for chemicals. In one embodiment, deionized water is used alongside nitrogen gas to optimize the cleaning process.

Additionally, Lu holds a patent for a "Lithography Mask Repairing Process." This method includes performing a beam scan on a photolithography mask followed by radiation treatment. The process utilizes an apparatus equipped with a beam generator, radiation source, and process gas source, ensuring that any residue is effectively removed from the mask's surface during repair.

Career Highlights

Chien-Hsing Lu is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited, where he continues to contribute to advancements in semiconductor technology. His work directly impacts the manufacturing processes, ultimately leading to better performance and reliability in semiconductor devices.

Collaborations

In his career, Lu has collaborated with distinguished colleagues, including Kun-Long Hsieh and Kun-Lung Hsieh. Together, they share a commitment to innovation in the semiconductor industry, striving to push the boundaries of technology and improve manufacturing standards.

Conclusion

Chien-Hsing Lu's innovative spirit and dedication to the semiconductor industry have led to significant advancements in cleaning and repair technologies for photolithographic masks. His patents not only demonstrate his technical expertise but also his vision for a cleaner, more efficient semiconductor manufacturing process. With ongoing efforts and collaborations, Lu is poised to continue making impactful contributions to the field.

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