Company Filing History:
3 out of 7,088 
Years Active: 2006-2012
Title: The Innovative Work of Inventor Chien-Fu Lee in Photomask Technology
Introduction
Chien-Fu Lee is a prominent inventor based in Taipei, Taiwan, known for his significant contributions to photomask technology. With a total of four patents to his name, Lee's work focuses on innovations that enhance the manufacturing processes in the semiconductor industry.
Latest Patents
Among his latest innovations are two related patents titled "Method of Manufacturing Photomask" and "Method of Repairing Optical Proximity Correction." These groundbreaking patents delineate a sophisticated process whereby graphic data of a photomask is utilized to perform optical proximity correction. Subsequently, a process rule check is conducted to ensure the integrity of the graphic data. Should any patterns fail this check, Lee's method allows for a targeted repair procedure, ensuring that only the problematic patterns are corrected. This innovative approach enhances the efficiency of photomask production and helps ensure quality control in semiconductor manufacturing.
Career Highlights
Chien-Fu Lee's career is marked by his association with United Microelectronics Corporation, where he leverages his extensive expertise in creating effective solutions for the intricacies of photomask manufacturing. His innovative mindset and commitment to advancing the field have made him a noteworthy figure within the company and the larger semiconductor community.
Collaborations
Collaboration is a key component of Lee's success, and he has worked closely with talented coworkers such as Ling-Chieh Lin and I-Hsiung Huang. Their collective efforts in research and development exemplify the synergy that leads to significant breakthroughs in technology.
Conclusion
Chien-Fu Lee stands out in the realm of semiconductor innovation, with a focus on improving photomask technology through well-crafted patents. His contributions not only facilitate the manufacture of advanced technologies but also reflect a commitment to excellence in engineering and design. As the semiconductor industry continues to evolve, Lee's work will undoubtedly remain pivotal in driving future advancements.