Chien-Ching Wu

Title: Chien-Ching Wu: Innovator in Lithographic Patterning Methods

Introduction

Chien-Ching Wu is a notable inventor based in Delfgauw, Netherlands. She has made significant contributions to the field of lithography, particularly in the development of methods for creating features on substrates. Her innovative approach has led to advancements in the efficiency and effectiveness of lithographic processes.

Latest Patents

Chien-Ching Wu holds a patent for a lithographic patterning method and system. This method involves applying a resist material to the surface of a substrate and performing various resist processing steps. These steps include selectively exposing the resist material to a surface treatment, chemically modifying the exposed locations, and developing the resist material layer to remove it locally. Additionally, the method incorporates a detection step that utilizes scanning probe microscopy to monitor chemical modifications during the processing steps. This innovative approach enhances the precision of lithographic patterning.

Career Highlights

Wu is affiliated with the Netherlands Organization for Applied Scientific Research (TNO), where she continues to push the boundaries of research in lithography. Her work has been instrumental in advancing the technology used in various applications, including semiconductor manufacturing.

Collaborations

Chien-Ching Wu has collaborated with esteemed colleagues such as Diederik Jan Maas and Jacques Cor Johan Van Der Donck. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chien-Ching Wu's contributions to lithographic patterning methods exemplify her dedication to innovation in the field. Her patent and ongoing work at TNO highlight her role as a leading inventor in this critical area of technology.