Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Chien-Ching Wu

Maarten Hubertus Van Es

Jacques Cor Johan Van Der Donck

Diederik Jan Maas

Klara Maturova

Robert Wilhelm Willekers

Lithographic patterning method for creating features on a surface of a substrate, including the steps of: applying a resist material to the surface; performing resist processing steps, including at least: selectively exposing the resist material layer to a surface treatment step, wherein the resist material in the exposed locations is chemically modified; and developing the resist material layer to selectively remove the resist material locally. The method further comprises detecting, during or after the resist processing steps, a chemical modification of the resist material for monitoring or evaluating the processing steps. The step of detecting is performed by scanning the surface using a scanning probe microscopy device, and wherein the scanning includes contacting the surface with the probe tip in a probing area. The probing area coincides with at least one location of the exposed locations and non-exposed locations, for detecting the chemical modification. The document further describes a system.

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Delfgauw, Netherlands

Chien-Ching Wu